首页>
外国专利>
INTEGRATED CIRCUIT SYSTEM EMPLOYING STRESS-ENGINEERED SPACERS
INTEGRATED CIRCUIT SYSTEM EMPLOYING STRESS-ENGINEERED SPACERS
展开▼
机译:集成应力系统间隔的集成电路系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
ABSTRACT INTEGRATED CIRCUIT SYSTEM EMPLOYINGSTRESS-ENGINEERED SPACERSAn integrated circuit system that includes: providing a substrate including a first region with a first device and a second device and a second region with a resistance device; configuring the first device, the second device, and the resistance device to include a first spacer and a second spacer; forming a stress inducing layer over the first region and the second region; processing at least a portion of the stress inducing layer formed over the first region to alter the stress within the stress inducing layer; and forming a third spacer adjacentthe second spacer of the first device and the second device from the stress inducing layer. Fig 16
展开▼