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Process for the deposition of a substrate with layers of hydrogenated amorphous silicon.
Process for the deposition of a substrate with layers of hydrogenated amorphous silicon.
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机译:用氢化非晶硅层沉积衬底的方法。
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摘要
A process for coating a substrate (1) with layers of hydrogenated amorphous silicon (a-Si layers: H, 7), characterized in that a sputtering gas and a reactive gas containing Si or an Si compound is fed a source of sputtering gas flow gap (8) with a white cathode containing silicon.
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