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IMPROVED METHODS AND APPARATUS FOR PRODUCING TRICHLORO-HYDROSILICON AND POLYSILICON

机译:制备三氯氢硅和多晶硅的改进方法和装置

摘要

Improved methods and apparatus for producing trichlorosilane and polysilicon are provided. The improved methods include the method for producing trichlorosilane and the method for producing polysilicon. The method for producing polysilicon includes the method for producing trichlorosilane by chloro-hydrogenation, and it comprises: a) heating metallurgical silicon to 300-500°C in baking oven, and then feeding the metallurgical silicon into a reactor; b) vaporizing and heating silicon tetrachloride to form gaseous silicon tetrachloride at 160-600°C by an exterior heater; c) preheating hydrogen chloride to 150-300°C by an exterior heater; d) preheating hydrogen to 300-600°C by an exterior heater; and e) feeding gases obtained from steps b), c), and d) into the reactor, wherein the mole ratio of hydrogen to silicon tetrachloride is 1-5:1, the mole ratio of hydrogen chloride to silicon tetrachloride is 1:1-20, maintaining the temperature of the reactor at 400-600°C, and keeping the pressure of the reactor at 1.0-3.0MPa. Polysilicon, which is applicable to the industry of semiconductor and solar battery, can be produced with low cost and high efficiency by the present method.
机译:提供了用于生产三氯硅烷和多晶硅的改进方法和设备。改进的方法包括生产三氯硅烷的方法和生产多晶硅的方法。多晶硅的制造方法包括通过氯氢化的三氯硅烷的制造方法,其包括:a)在烘烤炉中将冶金硅加热至300-500℃,然后将冶金硅进料到反应器中; b)通过外部加热器在160-600℃下蒸发和加热四氯化硅以形成气态四氯化硅; c)用外部加热器将氯化氢预热至150-300℃; d)通过外部加热器将氢气预热至300-600℃; e)将从步骤b),c)和d)获得的气体进料到反应器中,其中氢与四氯化硅的摩尔比为1-5:1,氯化氢与四氯化硅的摩尔比为1:1 -20,保持反应器温度在400-600℃,并保持反应器压力在1.0-3.0MPa。通过本方法可以以低成本和高效率生产适用于半导体和太阳能电池工业的多晶硅。

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