A NOZZLE FOR SUPPLYING SOLUTION AT SEMICONDUCTOR WAFER MANUFACTURING, AND APPARATUS FOR CLEANING WAFERS

摘要

A solution spread through nozzle of the spiral structure. Accordingly, the solution having torque generated by the spiral structure can improve the wafer cleaning capability. The injection hole(250) is located at the surface contacting with the wafer and the sprays the solution. The spiral structure is positioned at the upper portion of one or more injection holes. The spiral structure may have different diameters and the holes of the spiral structure may have different diameters.