CLEANING SOLUTION CIRCULATION APPARATUS OF SEMICONDUCTOR MANUFACTURING SYSTEM HAVING IMPROVED FILTERING FUNCTION BY INSTALLING BUBBLE REMOVER AT REAR END OF PUMP OF WAFER CLEANING APPARATUS AND/OR AT ADDITIONAL CLEANING SOLUTION SUPPLY TUBE

摘要

Purpose: the washing liquid circulating device in a kind of semi-conductor manufacturing system is arranged to improve a filtering function, by one foam extracting tool of installation in a rear end of a pump of a wafer cleaning apparatus and/or in an additional clean solution supply pipe. Construction: a rinse bath (110) is lowered by for storing a cleaning solution into one chip. One pump (120) is connected to rinse bath, in order to absorb cleaning solution. One filter (140) is used for from cleaning solution impurity screening. One heater (150) is used for hot filtration apparatus purified solution. One foam extracting tool (130) is mounted between pump and filter, in order to catch particle and foam.