THE ANTIMONY TELLURIDE THIN FILM AND SYNTHETIC SOLUTION WITH MODULATION OF NANO MULTILAYER AND NON-ISOTHERMAL HEAT TREATMENT

摘要

A manufacturing method of antimony telluride compound synthesized through controlling nanoscale of tellurium atomic layer is provided to reduce or perform easily a high temperature uniform thermal treating process by obtaining a uniform combination state of component and one-way orientation crystal thin film. A manufacturing method of antimony telluride compound synthesized through controlling nanoscale of tellurium atomic layer comprise steps of: depositing a multi-layered thin film after adjusting a thickness of a specific element in a normal temperature state; depositing a multi-layered thin film after adjusting a thickness of a specific element at a stat of maintaining a specific temperature; and being cooled after being heated to a specific normal temperature over specific temperature and maintained at the specific temperature for fixed time.