首页> 外国专利> Low temperature process, a soluble polyimide resin and a mixed composition prepared by pre used as an insulating film for an organic thin film transistor element

Low temperature process, a soluble polyimide resin and a mixed composition prepared by pre used as an insulating film for an organic thin film transistor element

机译:低温工艺,可溶解的聚酰亚胺树脂和通过预先制备而用作有机薄膜晶体管元件的绝缘膜的混合组合物

摘要

A low-temperature soluble polyimide resin blend composition is provided to improve the overall characteristics of an organic thin film transistor, particularly field effect mobility, by using the composition as an interlayer dielectric having reduced surface tension. A polyimide resin blend composition for a gate dielectric film of an organic transistor comprises 1-99 wt% of a soluble polyimide resin represented by the following formula 1, and 1-99 wt% of a soluble polyimide resin represented by the following formula 2. In the formulae, the formula A is at least one tetravalent group essentially including a specific aliphatic cyclic tetravalent group; the formula B is at least one divalent group; l is a natural number of 1-300; the formula C is at least one divalent group essentially including a divalent aromatic group having a pendant alkyl group; and m is a natural number of 1-300.
机译:通过使用低温可溶性聚酰亚胺树脂共混物组合物作为具有降低的表面张力的层间电介质,可以改善有机薄膜晶体管的整体特性,特别是改善场效应迁移率。用于有机晶体管的栅极介电膜的聚酰亚胺树脂共混组合物包含1-99wt%的由下式1表示的可溶性聚酰亚胺树脂和1-99wt%的由下式2表示的可溶性聚酰亚胺树脂。式中,式A为至少一个实质上包含特定的脂肪族环状四价基团的四价基团。式B为至少一个二价基团; l是1-300的自然数;式C为至少一个二价基团,其基本上包括具有侧链烷基的二价芳族基团; m是1-300的自然数。

著录项

  • 公开/公告号KR100873992B1

    专利类型

  • 公开/公告日2008-12-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20070013494

  • 发明设计人 이미혜;안 택;하선영;

    申请日2007-02-09

  • 分类号C08L79/08;C08G73/10;H01L29/786;

  • 国家 KR

  • 入库时间 2022-08-21 19:14:19

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