DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING COMPOSITION FOR DUV(DEEP UV) LITHOGRAPHY AND PROCESS OF PRODUCING PATTERNED MATERIALS BY USING THE SAME

摘要

A bottom anti-reflective coating composition and a method for making a patterned material form on a substrate are provided to minimize the reflectivity between a resist and back layer in performing lithography technique. A bottom anti-reflective coating composition comprises a compound of the chemical formula 3. In the chemical formula 3, Q- is anion and contains one on the chemical formula 4. The composition also contains: a polymer containing an aromatic ring of the chemical formula 1; a compound of the chemical formula 3; and an organic solvent. In the chemical formula 1, 1=n190; R1 is one of structure of the chemical formula 2; R2, R4 and R5 is hydrogen or methyl group; R3 is -H, -CH3, and -C2H5 or - C(CH3)3.