首页> 外国专利> FABRICATION METHOD OF NANO-DOTS ARRAY USING ATOMIC LAYER DEPOSITION AND SENSOR INCLUDING THE NANO-DOTS ARRAY

FABRICATION METHOD OF NANO-DOTS ARRAY USING ATOMIC LAYER DEPOSITION AND SENSOR INCLUDING THE NANO-DOTS ARRAY

机译:利用原子层沉积和包含纳米点阵列的传感器的纳米点阵列的制造方法

摘要

A fabrication method of nano-dots array using atomic layer deposition and a sensor including the nano-dots array are provided to uniformly manufacture the nano-dot array using a porosity nano template. A substrate(302) in which a porosity nano template(300) is arranged is provided to the inside of reaction chamber. The porosity nano template comprises the air bubble of the cylinder type which is formed by using the triblock copolymer. The first bubbler including the first precursor is set up to the temperature range in advance. The second bubbler including the second precursor is set up to the temperature range in advance. The first precursor and the second precursor are successively supplied to the reaction chamber. The first precursor and the second precursor successively react on the substrate surface exposed inside the air bubble.
机译:提供使用原子层沉积的纳米点阵列的制造方法和包括该纳米点阵列的传感器,以使用孔隙率纳米模板均匀地制造纳米点阵列。在反应室内部设置有配置有孔隙率纳米模板(300)的基板(302)。孔隙率纳米模板包括通过使用三嵌段共聚物形成的圆柱型气泡。包括第一前体的第一起泡器被预先设定到温度范围。包括第二前体的第二起泡器被预先设定到温度范围。将第一前体和第二前体相继供应至反应室。第一前体和第二前体在暴露于气泡内部的基板表面上依次反应。

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