POSITION CONTROL APPARATUS INCLUDING ITERATIVE LEARNING CIRCUIT, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND ITERATIVE LEARNING METHOD FOR USE IN POSITION CONTROL APPARATUS HAVING ITERATIVE LEARNING CIRCUIT INCLUDING LEARNING FILTER

摘要

A position control apparatus including an iterative learning circuit, an exposure apparatus, a method for manufacturing a device, and an iterative learning method for use in a position control apparatus having the iterative learning circuit including a learning filter are provided to calculate the force coefficient from the detected force ripple. A detection unit(1) is comprised to detect the location of the controlled system(P(p)). A subtracting part(2) is comprised to subtract the output of the detection unit from the target value. An iterative learning control circuit(6) includes the filter(L(p)) in which the deviation between the output of the detection unit and the target value is inputted, and feed-forwards the control input to the controlled system. The iterative learning control circuit comprises a memory(5) for storing the generated control input. The parameter production part is comprised to produce the parameter fluctuation of the controlled system. The property of the filter is changed according to the parameter fluctuation of the controlled system.