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EXPOSURE CONDITION SETTING METHOD, SUBSTRATE PROCESSING DEVICE, AND MEMORY MEDIA OF COMPUTER PROGRAM
EXPOSURE CONDITION SETTING METHOD, SUBSTRATE PROCESSING DEVICE, AND MEMORY MEDIA OF COMPUTER PROGRAM
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机译:曝光条件设定方法,基板处理装置以及计算机程序的存储介质
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摘要
The present invention is an exposure condition setting method, substrate processing apparatus, and relates to a computer program forming a resist film on the etched layer of the test substrate with an etched layer and the exposure amount and focus of the resist film a plurality of regions in a predetermined test pattern, changed by the value of each successively exposed and developed to form a resist pattern to be the plurality of portions. Next, the etched etching, and peeling the resist pattern determined by the shape of the etched film pattern of the plurality of portions on the scanner for interrogating methoxy-tree technique, the line width of the resist pattern and the exposure amount and a focus value for the sequential exposure etching pattern film based on the line width and provides a technique for determining the management range of the combination of the exposure amount and focus value allowed to obtain an etch pattern having a desired shape.
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