APPARATUS AND METHOD OF MANUFACTURING POLYSILICON USING LASER INDUCED CHEMICAL VAPOR DEPOSITION

摘要

An apparatus and a method of manufacturing the poly silicon using a laser induced chemical vapor deposition are provided to segregate the particle on a surface of silicon through the pyrolysis of the silane gas. A reactor(100) provides the reaction space segregating the silicon particle on the surface of the stick type seed silicon(300) through the pyrolysis of the silane gas. A nitrogen gas inlet(110) is formed in the fixed region of reactor. An exhaust pipe(130) is formed in the fixed region of reactor in order to exhaust the reaction gas. A gas supply part(200) supplies the silane gas such as the trichlorosilane gas or mono silane gas to the reactor. The gas supply part is formed in the upper of reactor. The gas supply part comprises a gas supplying nozzle(230) located inside the reactor and a gas supply pipeline(260) connected with the gas supplying nozzle. The gas supply tank accommodating the silane gas is connected to the end of the gas supply pipeline. The stick type seed silicon is installed inside the bottom side of reactor. The stick type seed silicon is preheated in the heater(400). The upper heating apparatus comprises the first electrode(420), the second electrode(440), a power line(460), and a power source(480).