A method for the production of titanium oxide layers with high photo-catalytic activity and titanium oxide layers produced in such a way

摘要

The present invention relates to a method for vacuum based deposition of a titanium oxide layer from the gas phase on a substrate, whereby a titanium oxide source with a deposition rate of less than 25 nm / s, in an oxygen-containing atmosphere and in the case of a substrate temperature of less than 500°C. is deposited and wherein, after the deposition of the coated substrate over a period of at least 30 minutes in an oxygen-containing atmosphere at temperatures between 200°C. and 1000°C. is heat treated.