A method for the production of titanium oxide layers with high photo-catalytic activity

摘要

A method for vacuum based deposition of a titanium oxide layer from the gas phase on a substrate by means of a vapor deposition technique,where, by means of the vapor deposition technique of a titanium oxide source, which ti₃O₅ which contains or consists of ti₃O₅ , with a deposition rate of less than 10 nm / s, in an oxygen-containing atmosphere and in the case of a substrate temperature of less than 500°C. and is deposited.wherein, after the deposition of the coated substrate over a period of at least 30 minutes in an oxygen-containing atmosphere at temperatures between 200°C. and 1000°C. is heat treated.