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Thyristor with improved activation performance, thyristor arrangement with a thyristor, a process for the manufacture of a thyristor and a thyristor arrangement

机译:具有改善的激活性能的晶闸管,具有晶闸管的晶闸管布置,晶闸管的制造方法和晶闸管布置

摘要

Thyristor withi) a semiconductor body (1), in which in a vertical direction (v), starting from a rear side (14) towards a front side (13), a p - doped emitter (8), a n - doped base (7), a p - doped base (6) and an n - doped the main emitter (5) are arranged successively;ii) a firing stages structure (ag1, ag2, ag3, and ag4) with at least one ignition stages emitter (51, 52, 53, 54); andiii) a metallization layer (4a, 4b), the at least a first section (45), thea) between two adjacent firing stages (ag1, ag2, ag3, and ag4) or between the of the main cathode (hk) nearest detonator stage (ag4) and the main cathode (hk) on the front side (13) and arranged with respect to the semiconductor body (1) is electrically insulated;b) above a first, at least in some sections (64) of the p - doped base (6) is disposed, in which the electrical conductivity of the p - doped base (6) and / or the thickness of the p - doped base (6) with respect to sections (63, 65) of the p - doped base (6), which in..
机译:晶闸管具有半导体本体(1),其中在垂直方向(v)上从背面(14)向正面(13)开始,p掺杂的发射极(8)和a掺杂的基极(7) ),p掺杂的基极(6)和n掺杂的主发射极(5)依次排列; ii)具有至少一个点火级发射极(51)的点火级结构(ag1,ag2,ag3和ag4) 52、53、54); iii)金属化层(4a,4b),至少两个第一烧成段(ag1,ag2,ag3和ag4)之间或最靠近雷管的主阴极(hk)之间的至少一个第一部分(45)thea)阶段(ag4)和位于正面(13)且相对于半导体本体(1)布置的主阴极(hk)电绝缘; b)至少在p的某些部分(64)的上方-设置了掺杂的基体(6),其中p-掺杂的基体(6)的电导率和/或p-掺杂的基体(6)相对于p-的部分(63、65)的厚度。掺杂的基极(6)

著录项

  • 公开/公告号DE102007041124B4

    专利类型

  • 公开/公告日2009-06-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20071041124

  • 发明设计人

    申请日2007-08-30

  • 分类号H01L29/74;H01L21/332;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:40

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