首页> 外国专利> Material measure for optical position measuring unit, which operates with light of central wavelength, comprises substrate with two areas, which code position information, which is selected with light of wavelength

Material measure for optical position measuring unit, which operates with light of central wavelength, comprises substrate with two areas, which code position information, which is selected with light of wavelength

机译:用于以中心波长的光工作的光学位置测量单元的材料测量,包括具有两个区域的基板,该区域编码位置信息,该区域信息是使用波长的光选择的

摘要

The material measure (4,5) comprises a substrate (9) with two areas. The two areas code a position information, which is selected with the light of a wavelength. The area of a lattice structure (7) comprises a period, which affects the optical characteristics of the material measure. The period of the lattice structure is smaller than the wavelength. An independent claim is included for an optical position measuring unit has a light source for linear polarized light of a central wavelength.
机译:材料量度(4,5)包括具有两个区域的衬底(9)。这两个区域编码位置信息,该位置信息是用波长的光选择的。晶格结构(7)的区域包括一个周期,该周期会影响材料量度的光学特性。晶格结构的周期小于波长。包括光学位置测量单元的独立权利要求,该光学位置测量单元具有用于中心波长的线性偏振光的光源。

著录项

  • 公开/公告号DE102008013164A1

    专利类型

  • 公开/公告日2009-09-10

    原文格式PDF

  • 申请/专利权人 DR. JOHANNES HEIDENHAIN GMBH;

    申请/专利号DE20081013164

  • 发明设计人 HUBER WALTER;

    申请日2008-03-07

  • 分类号G01D5/347;G01B11/00;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:14

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