Polishing buffer chemical - mechanical possessing of the grooves arranged in order to improve the use of the middle of the polishing.

• 1. 具有偏移的同心凹槽图案的抛光垫以及使用其抛光基板的方法 [P] . 中国专利： CN104781913B . 2017.10.20
• 2. 具有偏移的同心凹槽图案的抛光垫以及使用其抛光基板的方法 [P] . 中国专利： CN104781913A . 2015-07-15
• 3. Polishing buffer chemical - mechanical possessing a set of grooves spread with overlapping [P] . 法国专利： FR2879953B1 . 2009-02-13

  机译： 抛光缓冲剂化学-机械具有一系列重叠分布的凹槽。

• 4. CHIMICO-MECHANICAL POLISHING PAD WITH GROOVES ARRANGED TO IMPROVE THE USE OF THE POLISHING MEDIUM [P] . 法国专利： FR2879952A1 . 2006-06-30

  机译： 带有凹槽的化学机械抛光垫，可改善抛光介质的使用

• 5. Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity [P] . 美国专利： US10625393B2 . 2020-04-21

  机译： 化学机械抛光垫具有偏置的圆周槽，可提高去除率和抛光均匀性

• 1. Electrochemical characteristic of chemical-mechanical polishing of copper with oxide passive film [J] . 何捍卫, 胡岳华, 周科朝, 中国有色金属学报（英文版） . 2003,第004期
• 2. An Improved Design of Spiral Groove Mechanical Seal [J] . 周剑锋, 顾伯勤, 陈晔 中国化学工程学报：英文版 . 2007,第004期
• 3. Theoretical and experimental investigation of chemical mechanical polishing of W–Ni–Fe alloy [J] . Jiang Guo, Xiaolin Shi, Chuanping Song, 极端制造（英文） . 2021,第002期
• 4. Effect of chemical disinfectants on the transverse strength of heat-polymerized acrylic resins submitted to mechanical and chemical polishing. [J] . Orsi IA, Andrade VG The Journal of Prosthetic Dentistry . 2004,第4期
• 5. Surface roughness of acrylic resins submitted to mechanical and chemical polishing. [J] . Rahal JS, Mesquita MF, Henriques GE, Journal of oral rehabilitation . 2004,第11期
• 6. Surface texture and some properties of acrylic resins submitted to chemical polishing. [J] . Braun KO, Mello JA, Rached RN, Journal of oral rehabilitation . 2003,第1期
• 7. Analysis and Experiment of Removal Performance with Various Concentric Grooves on Pads in Chemical Mechanical Polishing [C] . Wei Chin-Chung, Horng Jeng-Haur, Lin Jen-Fin International Colloquium Tribology . 2010
• 8. Investigation of mechanical aspects of chemical mechanical polishing. [D] . Chang, Andrew Kunung. 2002
• 9. Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation [O] . Zeynep Ozdemir, Gul Bahar Basim 2017
• 10. Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation [O] . Zeynep Ozdemir, Gul Bahar Basim 2017

• 1. Chemical-mechanically polishing large area free-standing CVD diamond films [J] . ZHANG Pingwei ,TONG Tingting ,CAI Yunhong . 金刚石与磨料磨具工程 . 2018,第006期
• 2. Corrosion electrochemical mechanism of chemical mechanical polishing of copper in K_3Fe(CN)_6 solution [J] . 何捍卫 ,胡岳华 ,黄可龙 . 中国有色金属学会会刊：英文版 . 2002,第1期
• 3. 三氯化铁基抛光液化学机械抛光304不锈钢时化学作用机理 [C] . 苏建修 ,王占奎 ,李勇峰 . 第十四届切削与先进制造技术学术会议 . 2017
• 4. 使用磁体抛光体（Magnetic Compound Fluid Polishing Tool）抛光的新方法 [A] . 姜健 . 2005