POLISHING APPARATUS, POLISHING METHOD FOR GLASS SUBSTRATE, MANUFACTURING METHOD FOR GLASS SUBSTRATE, GLASS SUBSTRATE, AND MAGNETIC RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a polishing apparatus efficiently discharging polishing liquid in a simple structure.;SOLUTION: A rough polishing apparatus 21 includes a sun gear 23, an internal gear 25, and a carrier 27 which revolves and autorotates according to the rotation of the sun gear 23 and the internal gear 25. The rough polishing apparatus 21 includes an upper surface plate 29 and a lower surface plate 31 sandwiching the carrier 27. In addition, the rough polishing apparatus 21 is installed under the inner periphery of the lower surface plate 31 and has an annular first groove 43 which allows polishing liquid to flow thereinto. Part of a bottom face of the first groove 43 forms an opening 45 and the opening 45 is connected with a pipe 47 for polishing-liquid to flow thereinto from the first groove 43. The pipe 47 is installed under the lower surface plate 31 to extend from the first groove 43 toward the internal gear 25. In addition, the rough polishing apparatus 21 is installed under the outer periphery of the lower surface plate 31 and under one end of the pipe 47 and has a second groove 49 for polishing-liquid to flow thereinto. The second groove 49 is connected with a storage portion 41 through a pipe 57 or the like.;COPYRIGHT: (C)2011,JPO&INPIT