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Development of an AC Electrical Field Tribochemical Polishing Technique to Promote High-Efficiency Polishing for Glass Substrates

机译：交流电场栽培抛光技术的开发促进玻璃基板高效抛光

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Hiroshi IKEDA; Yoichi AKAGAMI; Michio UNEDA; Osamu OHNISHI; Syuhei KUROKAWA; Toshiro K. DOI;
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年度 2012
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1. New polishing method using water-based slurry under AC electric field for glass substrate [J] . Takayuki Kusumi, Yasuhiro Sato, Yoichi Akagami, Journal of magnetism and magnetic materials . 2011,第10期

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2. Highly efficient polishing technology for glass substrates using tribo-chemical polishing with electrically controlled slurry [J] . Hiroshi Ikeda, Yoichi Akagami Journal of Manufacturing Processes . 2013,第1期

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3. Tribochemical polishing CVD diamond film with FeNiCr alloy polishing plate prepared by MA-HPS technique [J] . Zewei Yuan, Zhuji Jin, Renke Kang Diamond and Related Materials . 2012,第1期

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4. Highly-efficient Polishing Technology for Glass Substrates Using Tribo-chemical Polishing with Electrically Controlled Slurry [C] . Hiroshi Ikeda, Yoichi Akagami Proceedings of the North American Manufacturing Research Institution of the Society of Manufacturing Engineers . 2012

机译：摩擦化学抛光与电控浆料的玻璃基板高效抛光技术
5. Tribochemical polishing of silicon nitride. [D] . Hah, Sangrok. 1995

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6. Novel Disc Hydrodynamic Polishing Process and Tool for High-Efficiency Polishing of Ultra-Smooth Surfaces [O] . Bin Lin, Xiang-Min Jiang, Zhong-Chen Cao, 2018

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7. The Development of AC Electric Field Assisted Polishing for Silicon Carbide Substrates with Control of Abrasive Behavior [O] . Takayuki KUSUMI, Yasuhiro SATO, Hiroshi IKEDA, 2013

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8. Application of Dry-Polishing Techniques to Water-Soluble Glass Ceramics [R] . Healey, J. T., McAllaster, M. E. 1981

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Development of an AC Electrical Field Tribochemical Polishing Technique to Promote High-Efficiency Polishing for Glass Substrates

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