首页> 外国专利> SUBSTRATE LIFTING AND LOWERING APPARATUS AND SUBSTRATE PROCESSING AND TRANSFER SYSTEM

SUBSTRATE LIFTING AND LOWERING APPARATUS AND SUBSTRATE PROCESSING AND TRANSFER SYSTEM

机译:基质提升放样装置以及基质加工和转移系统

摘要

PROBLEM TO BE SOLVED: To fully reduce the planar space of a substrate lifting and lowering apparatus 7 and promote the effective use of space inside a plant.;SOLUTION: A first attitude-switching member 29, equipped with a first pose switch holding assembly 37, is set up on one side of first substrate processing apparatus 3 is arranged so that it can swing about a horizontal axis; a second pose switching member 49, equipped with a second pose switch holding assembly 41, is set up on one side of second substrate processing apparatus 5 so that it can swing about a horizontal axis; a no-end member 63 extended vertically is arranged in a holding frame 53 installed upright at one side of the first pose-switching member 29 so as to allow cyclical run; and multiple lift-holding assemblies 69 are fitted at intervals on the no-end member 63, in a circumferential direction.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:为了充分减小基板升降装置7的平面空间并促进植物内部空间的有效利用。解决方案:第一姿态切换构件29,其配备有第一姿态开关保持组件37。在第一基板处理装置3的一侧设置有可绕水平轴摆动的P 1;在第二基板处理装置5的一侧,以能够绕水平轴摆动的方式设置有第二姿势切换部件49,该第二姿势切换部件49具备第二姿势开关保持组件41。在第一姿势切换部件29的一侧竖立设置的保持框架53上,配置有沿上下方向延伸的无端部件63,以允许循环运动。并且多个升降保持组件69在圆周方向上间隔地装配在无端部件63上。;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2010238764A

    专利类型

  • 公开/公告日2010-10-21

    原文格式PDF

  • 申请/专利权人 IHI CORP;

    申请/专利号JP20090082699

  • 发明设计人 WADA YOSHIYUKI;ISHIBASHI KIEN;

    申请日2009-03-30

  • 分类号H01L21/677;B65G49/06;B65G47/52;B65G47/30;H01L21/3065;

  • 国家 JP

  • 入库时间 2022-08-21 19:05:38

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