首页>
外国专利>
REACTION FORCE PROCESSING MECHANISM, STAGE APPARATUS PROVIDED WITH THE SAME, AND SEMICONDUCTOR INSPECTION APPARATUS PROVIDED WITH THE STAGE APPARATUS
REACTION FORCE PROCESSING MECHANISM, STAGE APPARATUS PROVIDED WITH THE SAME, AND SEMICONDUCTOR INSPECTION APPARATUS PROVIDED WITH THE STAGE APPARATUS
展开▼
机译:反应力处理机制,具有相同步骤的装置和具有阶段装置的半导体检查装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a downsized reaction force processing mechanism, a stage apparatus provided with the reaction force processing mechanism, and a semiconductor inspection apparatus provided with the stage apparatus.;SOLUTION: The reaction force processing mechanism 21 for processing reaction force applied to a plate 3 by the movement of an X axis stage 7 provided in the stage apparatus is provided with: a linear motor 26 for reaction processing which is provided with a magnet shaft 26A fixed to the plate 3 and a coil unit 26B connected to a rack and applies force to the plate 3; a first guide part 30 which is provided between the coil unit 26B and the plate 3 and guides the coil unit 26B in an X axis direction relative to the plate 3; and a transmission mechanism 27 which is provided between the coil unit 26B and the rack, and transmits the force in the X axis direction applied to the coil unit 26B to the rack.;COPYRIGHT: (C)2010,JPO&INPIT
展开▼