OPTIMUM PARAMETER EXTRACTION DEVICE AND EXTRACTION METHOD, AND MASK DATA, MASK AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for extracting an optimum parameter necessary for a calculation expression or a complicated model with high accuracy in a short period, specifically, a device for extracting an optimum mask parameter in a semiconductor production process or device simulation.;SOLUTION: This parameter extraction device 100 includes: a data input part 101; a parameter generation part 108 generating one or more parameter set sets; a first parameter extraction part 109 performing global optimization of the parameter set sets; and a second parameter extraction part 110 obtaining an optimum parameter set from the parameter set sets by a local optimization method. The parameter generation part 108 decides differentiability and continuity of the calculation expression or the model with the parameter set desired to be obtained as a variable, and the first parameter extraction part performs the global optimization by a particle group optimization method when the calculation expression or the model can be expressed as a continuous or differential function.;COPYRIGHT: (C)2010,JPO&INPIT