RESIST PATTERN SURFACE TREATING AGENT, SURFACE TREATMENT METHOD FOR RESIST PATTERN USING THE SURFACE TREATING AGENT, AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a surface treating agent for a freezing process, in which the line width and LWR (line width roughness) of a first resist pattern do not change by the freezing process and by the formation of a second resist pattern in a double patterning method, and to provide a treatment method of a pattern and a method for forming a resist pattern.;SOLUTION: The surface treating agent for a resist pattern contains a polymer and/or oligomer (A) having a structure expressed by general formula (1), and a compound (B) expressed by general formula (2). In the formulae, X represents a single bond or a divalent linking group; * represents a linking moiety with a polymer and/oligomer residue; A represents a single bond or an organic group having a valence of n; B represents a single bond, an alkylene group, a cycloalkylene group, or an aromatic group, wherein the alkylene group, the cycloalkylene group or the aromatic group may have a substituent; Nu represents a nucleophilic functional group, and n represents an integer from 2 to 8. A plurality of B and Nu may be each identical or different, however, it is not allowed that both A and B are single bonds.;COPYRIGHT: (C)2010,JPO&INPIT