Concerning the manner and the device null proximity effect of execution time amendment of the

摘要

(57) Abstract The electron beam pattern occurrence system which exposes the baseplate to pattern making use of raster scanning method. This system accumulates the raster display of pattern as plural pixel dose exposure levels. This system appraises these pixel dose exposure levels concerning the proximity effect of one, or more calculates the correction value of dose exposure level and pixel position. This system the device for calculating and accumulation the interim findings and the final returns is included according to need. Attendant upon the calculation of those results, it supplies correction value to the exposure dose modulator, applies to the formation of pattern there. Distantly the limits where it originates in electronic dispersion and electronic heating and closely the correction value for the limits proximity effect and the correction value for the proximity effect which originates in the entire thermal expansion are calculated, are supplied on the exposure under way, exposure is done with pattern of revision completed.