首页> 外国专利> Production manner of the crevice equipped substrate, the crevice equipped substrate and the micro glass lens substrate, the transmitted die screen and rear die projector

Production manner of the crevice equipped substrate, the crevice equipped substrate and the micro glass lens substrate, the transmitted die screen and rear die projector

机译:带缝隙的基板,带缝隙的基板和微玻璃透镜基板,透射模屏幕和背模投影仪的生产方式

摘要

PPROBLEM TO BE SOLVED: To provide a recessed substrate manufacturing method with which the final point of etching can exactly be judged, to provide a recessed substrate, a micro-lens substrate, a transmission screen and a rear type projector which are manufactured by using such a method. PSOLUTION: The invention is for the recessed substrate manufacturing method for forming a plurality of recesses on a substrate 5 by etching with a mask 6 that has a plurality of openings 63 made in it in a regular arrangement. The surface of the substrate to be etched has the first area 66 covered with the mask having the plurality of openings, and the second area 67 covered with a mask having a plurality of second openings 64 arranged having pitches smaller than the pitches between the first openings. In addition, a non-masking area 65 where a mask is not formed is provided between the first area and the second area. PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:

要解决的问题:提供一种可以精确地判断蚀刻终点的凹入基板的制造方法,以提供一种凹入基板,微透镜基板,透射屏和背面投影仪。通过使用这种方法。解决方案:本发明涉及用于通过在基板5上形成多个凹部的凹入基板制造方法,该掩模6具有以规则布置方式形成于其中的多个开口63的掩模6。待蚀刻的基板的表面具有覆盖有具有多个开口的掩模的第一区域66和覆盖有具有多个第二开口64的掩模的第二区域67,所述多个第二开口64的间距小于第一开口之间的间距。 。另外,在第一区域和第二区域之间设置有未形成掩模的非掩模区域65。

版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP4449502B2

    专利类型

  • 公开/公告日2010-04-14

    原文格式PDF

  • 申请/专利权人 セイコーエプソン株式会社;

    申请/专利号JP20040071377

  • 发明设计人 石井 誠;清水 信雄;

    申请日2004-03-12

  • 分类号G02B3/00;G03B21/10;G03B21/62;

  • 国家 JP

  • 入库时间 2022-08-21 18:58:40

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