Uses the vertical die chemical vapor phase growth device and the said device in the vacuum

摘要

PROBLEM TO BE SOLVED: To provide a chemical vapor growth system which can surely perform deposition by a chemical vapor deposition process with compact and simple system configuration in correspondence to upsizing of a substrate and a deposition method using the same.;SOLUTION: The vertical type chemical vapor growth system which performs deposition to the substrate 8 in an approximately upright state is constituted by mounting the inside of a first deposition chamber 3 with a plurality of conveyance rollers 23 which are provided with vertical type conveyance base plates 11 disposed with air flow apertures 20a, 20b and 20c at prescribed intervals over the entire surface rotationally movably around axes 21 in the substrate conveyance direction at the bottom ends of the conveyance base plates and perform substrate conveyance by supporting the bottom end edge of the substrate 8 along the substrate conveyance direction at the top and bottom ends of the conveyance base plates. The base plates 11 are inclined around the axes in such a manner that the substrate supporting surfaces 11s of the base plates 11 come to top surfaces. In addition, the substrate 8 is carried onto the surface 11s in the state of performing air flow toward the surfaces 11s of the base plates 11 by the apertures 20a, 20b and 20c.;COPYRIGHT: (C)2004,JPO