Vertical die decompression chemical vapor phase growth device

摘要

PURPOSE: To make reaction gas concentration in a furnace core tube uniform, and make film quality of a wafer accommodated in a boat constant. ;CONSTITUTION: A supply tube 1 for supplying gas of large specific gravity and gas discharge tube 2 corresponding with the tube 1 are arranged across a boat 10. Gas supplying ports 5 and gas discharging vents 6 are made large in the upper part, in order to have large conductance. The flow rate of supplied gas is increased from the upper part, and the uniformity of gas concentration caused by gas descent is restrained.;COPYRIGHT: (C)1993,JPO&Japio