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The error test evasion type test input formation method in 2 pattern tests of the semiconductor integrated circuit

机译:半导体集成电路的2种图形测试中的错误测试规避型测试输入形成方法

摘要

Being formation method of the test input which impresses test input in the semiconductor integrated circuit and 10 by comparison with the expectation of response decides the breakdown of combinational circuit 17, way the critical path 19 which is formed to the 1st process which decides the test pattern which includes logical value and the undecided value whose decision of breakdown presence is possible and the occasion where test pattern is impressed, 2nd process and the critical path 19 which select 19a and 19b, the critical gate of 19a and 19b the number of state changes which show the 3rd process and the quantity specifies of the critical gate which where gate state changes decreases, undecided valueIt possesses with the 4th process which it decides, critical path 19, it prevents the output delay from 19a and 19b by the fact that the number of state changes is decreased and evades the error test.
机译:通过与响应的期望相比较而在半导体集成电路和10上施加测试输入的测试输入的形成方法决定组合电路17的故障,以对决定测试图案的第一工序形成的关键路径19的方式进行。其中包括逻辑值和不确定值,可以决定是否存在击穿以及施加测试图案的情况,第二过程和选择19a和19b的临界路径19、19a和19b的临界门状态数量变化,显示第3步并确定门状态变化减小的临界门的数量,未定值它在第4步所决定的关键路径19中具有,它通过以下方式阻止输出延迟19a和19b:状态更改减少并且规避了错误测试。

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