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NANOTIP REPAIR AND CHARACTERIZATION USING FIELD ION MICROSCOPY

机译:场离子显微镜对纳米膜的修复和表征

摘要

A system (100) for characterizing surfaces can include a nanotip microscope (104) in a first pressure envelope (102) at a first pressure with an electrically conductive nanotip (110) mounted thereon for characterizing a sample surface. The system can also include an ion imaging system (122, 124, 128) within a second pressure envelope (120) at a second pressure. The second pressure can less than or equal to the first pressure and the pressure envelopes (102, 120) can be separated by a pressure limiting aperture (PLA) (132). The system can further include gas sources (116, 118) for introducing into the first pressure envelope (102) at least one gas, and a voltage supply (114) coupled to the nanotip (110) for generating an electric field between the nanotip (114) and the PLA (132). In the system, the electric field repels and ionizes molecules or atoms of the gas in proximity to the nanotip (110) and the ion imaging system (122, 124, 128) collects at least a portion the repelled and ionized molecules or atoms traversing the PLA (132) to image the nanotip (110).
机译:用于表征表面的系统( 100 )可以在第一压力和第一压力范围( 102 )中包括纳米尖端显微镜( 104 )安装在其上的用于表征样品表面的导电纳米尖端( 110 )。该系统还可以包括在第二压力下的第二压力包络线( 120 )内的离子成像系统( 122、124、128 )。第二压力可以小于或等于第一压力,并且压力包络线( 102、120 )可以由限压孔(PLA)( 132 )隔开。该系统可以进一步包括用于将至少一种气体引入第一压力包络线( 102 )的气源( 116、118 )和电源( 114 )耦合到纳米尖端( 110 ),以在纳米尖端( 114 )和PLA( 132 )之间产生电场。在该系统中,电场排斥并电离纳米尖端( 110 )和离子成像系统( 122、124、128 )附近的气体分子或原子收集至少一部分穿过PLA( 132 )的被排斥和离子化的分子或原子以对纳米尖端( 110 )成像。

著录项

  • 公开/公告号US2010038536A1

    专利类型

  • 公开/公告日2010-02-18

    原文格式PDF

  • 申请/专利权人 VLADIMIR UKRAINTSEV;

    申请/专利号US20080191855

  • 发明设计人 VLADIMIR UKRAINTSEV;

    申请日2008-08-14

  • 分类号G01N23/04;

  • 国家 US

  • 入库时间 2022-08-21 18:54:26

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