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Structure for a Through-Silicon-Via On-Chip Passive MMW Bandpass Filter

机译:硅通孔片上无源MMW带通滤波器的结构

摘要

A design structure is embodied in a machine readable medium for designing, manufacturing, or testing a design. The design structure includes a substrate including a silicon layer. Furthermore, the design structure includes a metal layer on a bottom side of the silicon layer and a dielectric layer on a top side of the silicon layer. Additionally, the design structure includes a top-side interconnect of the through-silicon via bandpass filter on a surface of the dielectric layer and a plurality of contacts in the dielectric layer in contact with the top-side interconnect. Further, the design structure includes a plurality of through-silicon vias through the substrate and in contact with the plurality of contacts, respectively, and the metal layer.
机译:设计结构体现在用于设计,制造或测试设计的机器可读介质中。设计结构包括具有硅层的衬底。此外,设计结构包括在硅层的底侧上的金属层和在硅层的顶侧上的介电层。另外,设计结构包括在介电层的表面上的硅通孔带通滤波器的顶侧互连以及在介电层中与顶侧互连接触的多个触点。此外,设计结构包括穿过衬底并分别与多个触点和金属层接触的多个硅通孔。

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