Systems and Methods for Surface Modification by Filtered Cathodic Vacuum Arc

摘要

Provided are filtered cathodic vacuum arc systems useful for modifying a surface of a substrate (e.g. depositing a thin film of a material onto a surface of a substrate and/or implanting a material into the near-surface region of a substrate). The systems are configured to stabilize a do arc discharge plasma from an arc source. Also provided are methods for modifying a surface of a substrate, which in some cases includes depositing a material onto a surface of a substrate, in some cases includes implanting a material into the near-surface region of a substrate, and in some cases includes both depositing a material onto a surface of a substrate and implanting a material into the near-surface region of a substrate using the subject cathodic arc systems. In addition, magnetic recording media produced by the subject systems and methods are provided.