RF antenna assembly having an antenna with transversal magnetic field for generation of inductively coupled plasma

摘要

An antenna assembly that consists of a holder which supports a transversal RF antenna with a plurality of multiturn coils connected in series or in parallel and intended for generation of an inductively coupled plasma discharge inside a container with a high plasma density in vicinity of the container's inner walls. The aforementioned discharge is used for inducing in the container a plasma chemical reaction between oxygen and organosilane with resulting deposition of the reaction product in the form of silicon dioxide onto the inner walls of the container for forming a fluid-impermeable barrier layer. A specific feature of the antenna is that it generates a magnetic field transversal to the longitudinal axis of the antenna, i.e., normal to the container's walls, where a maximal electric field, maximal plasma density and, correspondingly, maximal rate of deposition of silicon dioxide on the wall are provided.