首页> 外国专利> NONVOLATILE SEMICONDUCTOR MEMORY CIRCUIT UTILIZING A MIS TRANSISTOR AS A MEMORY CELL

NONVOLATILE SEMICONDUCTOR MEMORY CIRCUIT UTILIZING A MIS TRANSISTOR AS A MEMORY CELL

机译:非易失性半导体存储器电路,将MIS晶体管用作存储器单元

摘要

A memory circuit includes a latch having a first node and a second node to store data such that a logic level of the first node is an inverse of a logic level of the second node, a MIS transistor having a gate node, a first source/drain node, and a second source/drain node, the first source/drain node coupled to the first node of the latch, and a control circuit configured to control the gate node and second source/drain node of the MIS transistor in a first operation such that a lingering change is created in transistor characteristics of the MIS transistor in response to the data stored in the latch, wherein the MIS transistor includes a highly-doped substrate layer, a lightly-doped substrate layer disposed on the highly-doped substrate layer, diffusion regions formed in the lightly-doped substrate layer, a gate electrode, sidewalls, and an insulating film.
机译:一种存储器电路,包括:具有第一节点和第二节点的锁存器,用于存储数据,使得第一节点的逻辑电平与第二节点的逻辑电平相反; MIS晶体管具有栅极节点;第一源极/漏极节点和第二源极/漏极节点,第一源极/漏极节点耦合到锁存器的第一节点,以及控制电路,配置为在第一操作中控制MIS晶体管的栅极节点和第二源极/漏极节点从而响应于存储在锁存器中的数据而在MIS晶体管的晶体管特性中产生挥之不去的变化,其中MIS晶体管包括高掺杂衬底层,轻掺杂衬底层设置在高掺杂衬底层上扩散区形成在轻掺杂衬底层,栅电极,侧壁和绝缘膜中。

著录项

  • 公开/公告号US2009316477A1

    专利类型

  • 公开/公告日2009-12-24

    原文格式PDF

  • 申请/专利权人 TADAHIKO HORIUCHI;

    申请/专利号US20080141231

  • 发明设计人 TADAHIKO HORIUCHI;

    申请日2008-06-18

  • 分类号G11C11/34;G11C7/00;

  • 国家 US

  • 入库时间 2022-08-21 18:52:36

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