首页> 外国专利> Line-width measurement adjusting method and scanning electron microscope

Line-width measurement adjusting method and scanning electron microscope

机译:线宽测量调整方法及扫描电子显微镜

摘要

A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.
机译:一种线宽测量调整方法,当从分别以第一倍率用电子束扫描第一照射距离而获得的二次电子的强度分布图像中生成用于测量线宽的第一和第二电子束强度分布时使用,以及通过在第二倍率下用电子束扫描第二照射距离,包括以下步骤:调节第二倍率下的电子束的第二电子束强度分布,使得第二电子束强度分布等于第一电子束强度分布。电子束在第一倍放大倍数。当产生电子束强度分布时,可以通过增加或减小第二照射距离来调节第二电子束强度分布。

著录项

  • 公开/公告号US7663103B2

    专利类型

  • 公开/公告日2010-02-16

    原文格式PDF

  • 申请/专利权人 MASAYUKI KURIBARA;JUN MATSUMOTO;

    申请/专利号US20070726966

  • 发明设计人 MASAYUKI KURIBARA;JUN MATSUMOTO;

    申请日2007-03-23

  • 分类号G01N23/225;

  • 国家 US

  • 入库时间 2022-08-21 18:49:43

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号