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Transistors for replacing metal-oxide semiconductor field-effect transistors in nanoelectronics

机译:用于替换纳米电子学中的金属氧化物半导体场效应晶体管的晶体管

摘要

Junction field effect transistors (JFETs) are shown to be a viable replacement for metal oxide semiconductor field effect transistors (MOSFETs) for gate lengths of less than about 40 nm, providing an alternative to the gate leakage problems presented by scaled down MOSFETs. Integrated circuit designs can have complementary JFET (CJFET) logic cells substituted for existing MOSFET-based logic cells to produce revised integrated circuit designs. Integrated circuits can include JFETS where the channel comprises a wide bandgap semiconductor material and the gate comprises a narrow bandgap semiconductor material. Mixtures of JFET and MOSFET transistors can be included on an integrated circuit design.
机译:结型场效应晶体管(JFET)被证明是栅极长度小于约40 nm的金属氧化物半导体场效应晶体管(MOSFET)的可行替代品,为按比例缩小的MOSFET带来的栅极泄漏问题提供了替代方案。集成电路设计可以具有互补的JFET(CJFET)逻辑单元,以替代现有的基于MOSFET的逻辑单元,以产生修订的集成电路设计。集成电路可以包括JFETS,其中沟道包括宽带隙半导体材料,而栅极包括窄带隙半导体材料。 JFET和MOSFET晶体管的混合物可以包含在集成电路设计中。

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