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Method for producing partial SOI structures comprising zones connecting a superficial layer and a substrate
Method for producing partial SOI structures comprising zones connecting a superficial layer and a substrate
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机译:产生包括连接表面层和衬底的区域的部分SOI结构的方法
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摘要
The invention relates to a method for producing a semiconductor structure comprising a superficial layer, at least one embedded layer, and a support, which method comprises:a step of forming, on a first support, patterns in a first material,a step of forming a semiconductor layer, between and on said patterns,a step of assembling said semiconductor layer with a second support.展开▼