首页> 外国专利> MICRO-FLUID EJECTION DEVICE HAVING HIGH RESISTANCE HEATER FILM

MICRO-FLUID EJECTION DEVICE HAVING HIGH RESISTANCE HEATER FILM

机译:具有高电阻加热膜的微流体喷射装置

摘要

A semiconductor substrate for a micro-fluid ejection head. The substrateincludes a plurality of fluid ejection actuators disposed on the substrate.Each of the fluid ejection actuators includes a thin heater stack comprising athin film heater and one or more protective layers adjacent the heater. Thethin film heater is made of a tantalum-aluminum-nitride thin film materialhaving a nano-crystalline structure consisting essentially of A1N, TaN, andTaA1 alloys, and has a sheet resistance ranging from about 30 to about 100ohms per square. The thin film material contains from about 30 to about 70atomic% tantalum, from about 10 to about 40 atomic% aluminum and from about 5to about 30 atomic% nitrogen.
机译:用于微流体喷射头的半导体衬底。基材包括布置在基板上的多个流体喷射致动器。每个流体喷射致动器均包括薄加热器堆叠,该薄加热器堆叠包括:薄膜加热器和与加热器相邻的一层或多层保护层。的薄膜加热器由氮化钽铝薄膜材料制成具有基本上由AlN,TaN和Al组成的纳米晶体结构TaAl合金,其薄层电阻约为30到100每平方欧姆。薄膜材料包含约30至约70原子%的钽,约10至约40原子%的铝和约5达到约30原子%的氮。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号