首页> 外国专利> DATA CORRECTING HIERARCHICAL INTEGRATED CIRCUIT LAYOUT ACCOMMODATING COMPENSATE FOR LONG RANGE CRITICAL DIMENSION VARIATION

DATA CORRECTING HIERARCHICAL INTEGRATED CIRCUIT LAYOUT ACCOMMODATING COMPENSATE FOR LONG RANGE CRITICAL DIMENSION VARIATION

机译:大范围关键尺寸变化的数据校正分层综合电路布局补偿

摘要

A solution for performing a data correction on a hierarchical integrated circuit layout is provided. A method includes: receiving a CD compensation map for the long range critical dimension variation prior to the data correction; grouping compensation amounts of the CD compensation into multiple compensation ranges; generating multiple target layers corresponding to the multiple compensation ranges; super-imposing a region of the CD compensation map having a compensation amount falling into a compensation range over a respective target layer to generate a target shape; performing the data correction on the layout to generate a data corrected layout; performing the data correction on the target shape separately to generate a data corrected target shape; and combining the data corrected layout and the data corrected target shape based on the CD compensation map.
机译:提供了一种用于在分层集成电路布局上执行数据校正的解决方案。一种方法包括:在数据校正之前,接收用于远距离临界尺寸变化的CD补偿图;以及将CD补偿的补偿金额分为多个补偿范围;生成与多个补偿范围相对应的多个目标层;在各目标层上重叠具有补偿量的补偿量的CD补偿图的区域,以产生目标形状;对布局进行数据校正以生成数据校正的布局;分别对目标形状进行数据校正,以生成数据校正后的目标形状;基于CD补偿图,将数据校正后的布局与数据校正后的目标形状进行组合。

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