This invention provides a nitrogen radical generator which generate nitrogen radicals without generating plasma, has a simple structure, and can realize a size reduction. A nitrogen radical generator (100) comprises a polysilicon layer (103) including a nanosilicon layer (104) having one main face (104m), a silicon substrate electrode (102) provided on the other main face (103n) of the polysilicon layer (103), a surface electrode (105) provided on one main face (104m) of the nanosilicon layer (104), a first chamber(101) for housing these elements, a first power supply (109) for applying a positive voltage (V1) to the surface electrode (105), a gas inflow port (107) for allowing a nitrogen gas to flow into the first chamber (101), a nitrogen radical generation space (140) for bringing electrons released from one main face (104m) of the nanosilicon layer (104), upon the application of a positive voltage (V1), into contact with the nitrogen gas to generate nitrogen radicals, and a radical outflow port (108) for allowing the nitrogen radicals to discharge from the first chamber (101).
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