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EXPOSURE DEVICE, OPERATION DECISION METHOD, SUBSTRATE TREATMENT SYSTEM AND MAINTENANCE MANAGEMENT METHOD, AND DEVICE MANUFACTURING METHOD
EXPOSURE DEVICE, OPERATION DECISION METHOD, SUBSTRATE TREATMENT SYSTEM AND MAINTENANCE MANAGEMENT METHOD, AND DEVICE MANUFACTURING METHOD
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机译:曝光装置,操作决定方法,基板处理系统和维护管理方法以及装置制造方法
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摘要
An exposure apparatus is equipped with a main controller (120) that decides an operation of the exposure apparatus based on information on maintenance from a C/D. Therefore, the main controller (120) can decide to perform a specific operation, which is necessary for maintaining performance of the exposure apparatus and requires stop of the primary operation of the exposure apparatus, during maintenance of the C/D, that is, when the primary operation of the exposure apparatus has to be stopped by necessity, in parallel with the maintenance of the C/D. As a consequence, downtime of the exposure apparatus necessary for performing the specific operation can be decreased as a whole, which makes it possible to improve the operating rate without lowering apparatus performance of the exposure apparatus that is inline connected to a substrate processing apparatus.
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