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PROCESS OF MAKING AN OPTICAL FILM BY ATOMIC LAYER DEPOSITION (ALD) AT ATMOSPHERIC PRESSURE
PROCESS OF MAKING AN OPTICAL FILM BY ATOMIC LAYER DEPOSITION (ALD) AT ATMOSPHERIC PRESSURE
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机译:在大气压力下通过原子层沉积(ALD)制作光学膜的过程
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摘要
A process of making an optical film or optical array includes simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate; wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material; wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film; repeating the first step a plurality of times to produce a first thickness of a first film layer with a first optical property; wherein the process is carried out at or above atmospheric pressure; repeating the first and second steps to produce a second film layer; and wherein the process is carried out substantially at or above atmospheric pressure.
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