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Optical Transmittance Improvements of Al_2O_3/TiO_2 Multilayer OLED Encapsulation Films Processed by Atomic Layer Deposition

机译:Al_2O_3 / TiO_2的光学透射率改进通过原子层沉积处理的多层OLED封装膜

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摘要

Encapsulation of organic light-emitting diodes (OLEDs) is the only way to prevent degradation due to the penetration of moisture and oxygen. However, the upper encapsulation layer, located in the path through which light from the OLED passes, adversely affects light transmission. In this study, we calculated the optical transmittance by using admittance trajectory simulation and compared the data with actual Al_2O_3/TiO_2 multilayer film processed by atomic layer deposition (ALD). By applying the simulated data on to actual encapsulation layer, we can observe the optical transmittance increase of up to 8% compared to the film of Al_2O_3/TiO_2/Al_2O_3 structure. Over 90% of optical transmittance was achieved for all the visible wavelength ranges while maintaining water vapor transmission rate (WVTR) of the processed multilayer thin film as low as of 5 × 10~(-5) g/m~2/day, which was measured using MOCON Aquatran 2.
机译:封装有机发光二极管(OLED)是防止水分和氧气渗透导致退化的唯一方法。然而,位于来自OLED的光通过的路径中的上封装层对光传输产生不利影响。在本研究中,我们使用导纳轨迹模拟计算了光学透过率,并将数据与原子层沉积(ALD)处理的实际Al_2O_3/TiO_2多层膜进行了比较。通过将模拟数据应用到实际的封装层上,我们可以观察到,与Al_2O_3/TiO_2/Al_2O_3结构的薄膜相比,光学透过率增加了8%。利用MOCON-Aquatran 2测量了经处理的多层膜的水蒸气透过率(WVTR),使其在所有可见光波长范围内均达到90%以上的光学透过率。

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