Deposition process of a nanocomposite film and apparatus therefor

摘要

It is provided a deposition process (1) of film (10) on surfaces to be coated (20) in particular consisting in a PVD process, comprising: a deposition step (2) of an aggregating layer (11) involving a high-vacuum deposition process consisting in a PVD process, and an inclusion step (3) of nanoparticles (12) simultaneous with said deposition step (2), the aggregating layer (11) being suitable to retain and at least partly encapsulate the nanoparticles (12) on the surface to be coated (20).