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PLASMA TREATMENT APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE WITH ATMOSPHERIC PRESSURE GLOW DISCHARGE ELECTRODE CONFIGURATION
PLASMA TREATMENT APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE WITH ATMOSPHERIC PRESSURE GLOW DISCHARGE ELECTRODE CONFIGURATION
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机译:等离子体处理装置和用大气压力辉光放电电极构型处理基质的方法
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摘要
Plasma treatment apparatus and method for treating a substrate (6, 7) e.g. for deposition of a layer on the substrate (6, 7). Two opposing electrodes (2, 3) and a treatment space (5) are provided. A dielectric barrier (6, 7; 2a, 3a), comprising in operation the substrate, is provided in the treatment space (5) between the at least two opposing electrodes (2, 3) which are connected to a plasma control unit (4). A gap distance (g) is the free distance in the treatment space (5) of a gap between the at least two opposing electrodes (2, 3) in operation. A total dielectric distance (d) is the sum of the dielectric thickness of the dielectric layers (2a, 3a) and the substrate (6, 7). The product of gap distance (g) and total dielectric distance (d) is controlled to a value less than or equal to 1.0 mm2.
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