首页> 外国专利> PERPENDICULAR MAGNETIC NON-VOLATILE MEMORY DEVICE AND A MANUFACTURING METHOD THEREOF TO PREVENT THE DEGRADATION OF THE MAGNETIC TUNNEL JUNCTION DUE TO HIGH TEMPERATURE HEAT TREATMENT

PERPENDICULAR MAGNETIC NON-VOLATILE MEMORY DEVICE AND A MANUFACTURING METHOD THEREOF TO PREVENT THE DEGRADATION OF THE MAGNETIC TUNNEL JUNCTION DUE TO HIGH TEMPERATURE HEAT TREATMENT

机译:垂直磁非挥发性存储器件及其制造方法,以防止由于高温热处理而引起的磁隧道结的退化

摘要

PURPOSE: A perpendicular magnetic non-volatile memory device and a manufacturing method thereof are provided to manufacture MRAM with high integrity by applying an STT-MRAM cell to the memory.;CONSTITUTION: A perpendicular magnetic non-volatile memory device comprises gates(23), a source line, an MTJ(Magnetic Tunnel Junction), and a bit line. The gates are formed on a semiconductor substrate. The source line is connected to a source/drain region shared by adjacent gates. The MTJs are connected to the non-sharable source/drain region of the gates and one-to-one. The bit line is connected to MTJs.;COPYRIGHT KIPO 2010
机译:目的:提供一种垂直磁性非易失性存储器件及其制造方法,以通过将STT-MRAM单元应用于存储器来制造具有高完整性的MRAM;组成:垂直磁性非易失性存储器件包括栅极(23) ,源极线,MTJ(磁性隧道结)和位线。栅极形成在半导体衬底上。源极线连接到由相邻栅极共享的源极/漏极区域。 MTJ一对一地连接到​​栅极的不可共享的源/漏区。位线连接到MTJ。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100005449A

    专利类型

  • 公开/公告日2010-01-15

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20080065484

  • 发明设计人 KIM HYUN JEONG;

    申请日2008-07-07

  • 分类号H01L27/115;H01L21/8247;G11C11/15;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:32

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