METHOD FOR MANUFACTURING AN OPTICAL DEVICE WITH A THIN FILM TYPE NONLINEAR CURRENT CHARACTERISTIC THROUGH THE REACTION WITH AN ULTRAVIOLET RAY AND A VISIBLE RAY

摘要

PURPOSE: A method for manufacturing an optical device with a thin film type nonlinear current characteristic is provided to obtain a nonlinear current characteristic using the optical device which reacts with the light from a light emitting diode.;CONSTITUTION: A zinc oxide is deposited by a sputtering method using a zinc oxide target(S100). A deposition process is performed under an argon atmosphere without the oxygen injection. The nitrogen is additionally injected in a deposition thickness of 50 to 1000 nm. A thermal process is performed under the oxygen atmosphere after a thin film deposition process(S110). The thermal process is performed by an in-situ method using a growth chamber in a vacuum state or an ex-situ process using a thermal chamber outside the vacuum state. A deposition temperature is between a room temperature and 400 degrees centigrade. The temperature of the thermal process is between 100 to 600 degrees centigrade.;COPYRIGHT KIPO 2010