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ZINC OXIDE STRUCTURE GROWTH METHOD USING A METAL ORGANIC CHEMICAL VAPOR DEPOSITION INTRODUCING A GAS CARRIER
ZINC OXIDE STRUCTURE GROWTH METHOD USING A METAL ORGANIC CHEMICAL VAPOR DEPOSITION INTRODUCING A GAS CARRIER
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机译:引入气体载体的金属有机化学气相沉积法制备氧化锌结构
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摘要
PURPOSE: A zinc oxide structure growth method using a metal organic chemical vapor deposition method introducing a gas carrier is provided to form a vertical nano-bar by controlling the flow rate of a gas carrier.;CONSTITUTION: The flow rate of oxygen precursor source gas and diethyl zinc precursor is controlled and the gases are supplied through a gas feed assembly to a reaction container. A zinc oxide structure grows up on a substrate by ejecting a diethyl zinc precursor and oxygen precursor source gas through a gas ejecting unit which is installed inside the reaction container. The source gas comprises a carrier gas. The carrier gas is argon gas. The inner pressure of the reaction container is 0.1 ~ 1.0 Tor. The inner temperature of the reaction container is 300 ~ 400°C.;COPYRIGHT KIPO 2010
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