首页> 外国专利> MOLD MANUFACTURING METHOD FOR A NANOIMPRINT WHICH USES NANOIMPRINT AND DRY ETCHING PROCESS AND A PATTERN CASTING METHOD USING A MOLD FOR NANOIMPRINT

MOLD MANUFACTURING METHOD FOR A NANOIMPRINT WHICH USES NANOIMPRINT AND DRY ETCHING PROCESS AND A PATTERN CASTING METHOD USING A MOLD FOR NANOIMPRINT

机译:使用纳米印记和干蚀刻工艺的纳米印记的模具制造方法以及使用纳米印记的模具的铸模方法

摘要

PURPOSE: A mold for nano imprint having a mold manufacturing method for nano imprint and the pattern casting method using the mold for nano imprint is the multi-stage pattern or micro-pattern is used. It patterns nano-scale and the molding of the micro-pattern of the complex three dimensional shape is made possible.;CONSTITUTION: A resin(23) for a mold is spread between a substrate(21) and a master mold patterning a metal pattern(22). Substrate and master mold are arranged and it is imprinted. The resin for the mold hardens. After making heterogamete the master mold, the resin for the mold hardening as described above is etched and the replica mold(20A) for nano imprint is manufactured. The replica mold for nano imprint has the three-dimensional pattern of the multilevel form.;COPYRIGHT KIPO 2010
机译:目的:用于纳米压印的模具具有用于纳米压印的模具制造方法,并且使用使用用于纳米压印的模具的图案浇铸方法是多阶段图案或微图案。它可以对纳米尺寸进行图案化,并且可以模制复杂的三维形状的微型图案。;组成:用于模具的树脂(23)散布在基板(21)和对金属图案进行图案化的主模具之间(22)。基板和母模已排列并被压印。模具用树脂硬化。在将异配子制成母模之后,蚀刻如上所述的用于模制硬化的树脂,并制造用于纳米压印的复制模(20A)。用于纳米压印的复制品模具具有多层形式的三维图案。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100033560A

    专利类型

  • 公开/公告日2010-03-31

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20080092498

  • 发明设计人 CHO YOUNG TAE;KIM JEONG GIL;

    申请日2008-09-22

  • 分类号H01L21/027;H01L21/56;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:05

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