首页> 外国专利> SUBSTRATES COATING UNIT, A SUBSTRATES TREATING APPARATUS HAVING THE SAME AND A METHOD OF TREATING THE SUBSTRATES USING THE SAME, CAPABLE OF IMPROVING THE UNIFORMITY OF A THIN FILM IN A COATING PROCESS

SUBSTRATES COATING UNIT, A SUBSTRATES TREATING APPARATUS HAVING THE SAME AND A METHOD OF TREATING THE SUBSTRATES USING THE SAME, CAPABLE OF IMPROVING THE UNIFORMITY OF A THIN FILM IN A COATING PROCESS

机译:基材涂布单元,具有相同功能的基材处理装置以及使用该基材的基材处理方法,能够改善涂布过程中薄膜的均匀性

摘要

PURPOSE: A substrates coating unit, a substrates treating apparatus having the same and a method of treating the substrates using the same are provided to maintain the temperature of a substrate a certain level by including a temperature control member on the bottom of the substrate.;CONSTITUTION: A substrate support member(710) supports a substrate. A coating nozzle](760) sprays a coating fluid on the substrate to form a film on the substrate. A temperature-controlled member(740) is contacted with the bottom of the substrate to control the temperature of the substrate. The substrate support member comprises a spin head(711) and a rotary shaft(712). The spin head supports the center of the substrate. The rotary shaft rotates the spin head.;COPYRIGHT KIPO 2010
机译:目的:提供一种基板涂布单元,具有该基板涂布单元的基板处理装置以及使用该基板涂布装置处理基板的方法,其通过在基板的底部包括温度控制部件来将基板的温度维持在一定水平。组成:基板支撑件(710)支撑基板。涂覆喷嘴(760)在衬底上喷涂涂覆液以在衬底上形成膜。温度控制构件(740)与基板的底部接触以控制基板的温度。基板支撑构件包括旋转头(711)和旋转轴(712)。旋转头支撑衬底的中心。旋转轴使旋转头旋转。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100060690A

    专利类型

  • 公开/公告日2010-06-07

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20080119389

  • 发明设计人 CHO SOO HYUN;

    申请日2008-11-28

  • 分类号H01L21/02;H01L21/324;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:38

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