APPARATUS FOR COATING BOTH SIDES OF A SUBSTRATE AND A METHOD THEREOF, CAPABLE OF IMPROVING THE PERFORMANCE OF A SUBSTRATE BY EFFECTIVELY COATING A THIN FILM TO BOTH SIDES OF THE SUBSTRATE

摘要

PURPOSE: An apparatus for coating both sides of a substrate and a method thereof are provided to improve the performance of a substrate because one electrode is served as a main electrode for generating plasma and the other electrode is used as an electrode for applying radio frequency bias.;CONSTITUTION: An apparatus for coating both sides of a substrate comprises a chamber(110) and first and second rolling units(151,152). A substrate(170) is coated in the chamber and consecutively moves in the chamber through the first and second rolling units. The first and second rolling units are correspondently installed in both sides of the chamber. The chamber comprises a first plasma generating unit(111) and a second plasma generating unit(112). The substrate moves between upper and lower electrodes through the first and second rolling units.;COPYRIGHT KIPO 2012